DocumentCode
3513176
Title
Coupled modeling of evolution of impurity/defect distribution and cell performance
Author
Tryznadlowski, Bart ; Yazdani, Armin ; Chen, Renyu ; Dunham, Scott T.
Author_Institution
Dept. of Electr. Eng., Univ. of Washington, Seattle, WA, USA
fYear
2012
fDate
3-8 June 2012
Abstract
We demonstrate the use of end-to-end predictive modeling to optimize silicon solar cell fabrication processes. Coupled continuum models for dopants, metals, and light elements (e.g., O) are used to predict the distribution of electronically active defects. The models include point defect-mediated diffusion of boron and phosphorus from solid sources at both the emitter and back surface field. Interactions between metals and boron, boron and oxygen, dopants and point defects, and metals and dopant-defect complexes are modeled. The resulting impurity and defect distributions along with associated trap levels and capture cross-sections are passed to device simulation. The modeling results suggest strategies to optimize device performance in the presence of contamination.
Keywords
boron; elemental semiconductors; impurity distribution; phosphorus; silicon; solar cells; B; P; Si; back surface field; coupled continuum models; cross-sections; defect distributions; device simulation; dopant-defect complexes; electronically active defects; emitter surface field; impurity-defect distribution; light elements; metals; point defect-mediated diffusion; predictive modeling; solar cell fabrication processes; solid sources; trap levels; Boron; Gettering; Iron; Performance evaluation; Semiconductor process modeling; Silicon; charge carrier lifetime; gettering; photovoltaic cells; semiconductor device modeling; semiconductor process modeling;
fLanguage
English
Publisher
ieee
Conference_Titel
Photovoltaic Specialists Conference (PVSC), 2012 38th IEEE
Conference_Location
Austin, TX
ISSN
0160-8371
Print_ISBN
978-1-4673-0064-3
Type
conf
DOI
10.1109/PVSC.2012.6317604
Filename
6317604
Link To Document