• DocumentCode
    3513770
  • Title

    Optical characterization of structurally graded Si1−xGex:H thin films

  • Author

    Podraza, Nikolas J. ; John, David B Saint

  • Author_Institution
    Dept. of Phys. & Astron., Univ. of Toledo, Toledo, OH, USA
  • fYear
    2012
  • fDate
    3-8 June 2012
  • Abstract
    High efficiency thin film silicon solar cells consist of multiple junctions with hydrogenated amorphous silicon, silicon germanium alloys, and nanocrystalline silicon (nc-Si:H) absorbers. Uniformity over large areas is challenging for nc-Si:H and an accurate method of mapping material quality via a technique like ex situ spectroscopic ellipsometry (SE) is desirable. In situ, real time SE (RTSE) measurements during growth show material evolves from amorphous to nanocrystalline, which complicates the analysis of single SE measurements. Information from RTSE has been applied to develop procedures to accurately extract the thickness at which nanocrystallites initially appear and coalesce from single SE measurements.
  • Keywords
    Ge-Si alloys; ellipsometry; hydrogen; nanostructured materials; semiconductor thin films; solar cells; Si1-xGex:H; nanocrystallite; optical characterization; real time spectroscopic ellipsometry; single SE measurement; solar cell; structurally graded thin film; Analytical models; Films; Nanostructured materials; Rough surfaces; Sensitivity; Surface roughness; ellipsometry; metrology; photovoltaic cells; refractive index; silicon; silicon germanium;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Photovoltaic Specialists Conference (PVSC), 2012 38th IEEE
  • Conference_Location
    Austin, TX
  • ISSN
    0160-8371
  • Print_ISBN
    978-1-4673-0064-3
  • Type

    conf

  • DOI
    10.1109/PVSC.2012.6317635
  • Filename
    6317635