DocumentCode
3513770
Title
Optical characterization of structurally graded Si1−x Gex :H thin films
Author
Podraza, Nikolas J. ; John, David B Saint
Author_Institution
Dept. of Phys. & Astron., Univ. of Toledo, Toledo, OH, USA
fYear
2012
fDate
3-8 June 2012
Abstract
High efficiency thin film silicon solar cells consist of multiple junctions with hydrogenated amorphous silicon, silicon germanium alloys, and nanocrystalline silicon (nc-Si:H) absorbers. Uniformity over large areas is challenging for nc-Si:H and an accurate method of mapping material quality via a technique like ex situ spectroscopic ellipsometry (SE) is desirable. In situ, real time SE (RTSE) measurements during growth show material evolves from amorphous to nanocrystalline, which complicates the analysis of single SE measurements. Information from RTSE has been applied to develop procedures to accurately extract the thickness at which nanocrystallites initially appear and coalesce from single SE measurements.
Keywords
Ge-Si alloys; ellipsometry; hydrogen; nanostructured materials; semiconductor thin films; solar cells; Si1-xGex:H; nanocrystallite; optical characterization; real time spectroscopic ellipsometry; single SE measurement; solar cell; structurally graded thin film; Analytical models; Films; Nanostructured materials; Rough surfaces; Sensitivity; Surface roughness; ellipsometry; metrology; photovoltaic cells; refractive index; silicon; silicon germanium;
fLanguage
English
Publisher
ieee
Conference_Titel
Photovoltaic Specialists Conference (PVSC), 2012 38th IEEE
Conference_Location
Austin, TX
ISSN
0160-8371
Print_ISBN
978-1-4673-0064-3
Type
conf
DOI
10.1109/PVSC.2012.6317635
Filename
6317635
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