Title :
Rapid prototyping of integrated microfluidic devices for combined radiation detection and plasma separation
Author :
Convert, L. ; Aimez, V. ; Charette, P. ; Lecomte, R.
Author_Institution :
Center (CRN2), Univ. de Sherbrooke, Sherbrooke, QC
Abstract :
A rapid prototyping method was developed to integrate a microfluidic plasma separation device over a Si based radiation detector. KMPR photoresist was used to produce high pressure resistant channels sealed by a glass cover. Two methods were investigated to make access holes in the cover: laser micromachining and a simplified glass wet etching process. The lab-on-chip concept where a plasma separation device is coupled to an embedded on-chip p-i-n photodiode used as a high sensitivity beta particle detector was investigated. A first detector prototype was fabricated and characterized. KMPR autofluorescence was investigated to optimize microfluidic function characterization with fluorescent beads.
Keywords :
beta-ray detection; etching; fluorescence; lab-on-a-chip; laser beam machining; microfluidics; micromachining; p-i-n photodiodes; photoresists; rapid prototyping (industrial); separation; silicon radiation detectors; autofluorescence; embedded on-chip p-i-n photodiode; fluorescent beads; glass wet etching process; high pressure resistant channels; integrated microfluidic devices; lab-on-chip concept; laser micromachining; photoresist; plasma separation; radiation detection; rapid prototyping method; silicon based radiation detector; Glass; Microfluidics; Micromachining; PIN photodiodes; Plasma applications; Plasma devices; Prototypes; Radiation detectors; Resists; Wet etching; KMPR photoresist; Microfluidic; glass etch; p-i-n photodiode; rapid prototyping;
Conference_Titel :
Microsystems and Nanoelectronics Research Conference, 2008. MNRC 2008. 1st
Conference_Location :
Ottawa, Ont.
Print_ISBN :
978-1-4244-2920-2
Electronic_ISBN :
978-1-4244-2921-9
DOI :
10.1109/MNRC.2008.4683389