DocumentCode :
3514515
Title :
Wafer Scale Integration Enabling Space Science
Author :
Wesolek, Danielle M. ; Darrin, M. Ann Garrison ; Osiander, Robert
Author_Institution :
Appl. Phys. Lab., Johns Hopkins Univ., Laurel, MD
fYear :
2008
fDate :
1-8 March 2008
Firstpage :
1
Lastpage :
7
Abstract :
Wafer scale integration enables the ability to miniaturize space craft instrument builds. We use the term wafer scale to indicate a packaging concept where the wafer is the substrate eliminating the use of individually packaged microstructures. The key here is the combination of advanced integration and miniaturization. The Johns Hopkins University Applied Physics Laboratory (JHUAPL) in collaboration with the US Air Force Academy is building a wafer integrated plasma spectrometer (WISPER) for mapping missions. The fabrication of the WISPER instrument suite uses a number of Micro Electro Mechanical Systems (MEMS) and micro electronics fabrication technologies. JHUAPL has successfully demonstrated these approaches in the fabrication of the single instrument currently in orbit on the FalconSat-3 mission. This instrument is a Flat Plasma Spectrometer (FlaPS) which includes a sensor-head array, printed circuit board with amplifier array electronics, power supply, and chassis which occupies a volume of approximately 400 cm3 in a 0.5 kg, 700 mW package. The sensor head array is fabricated and assembled at the wafer-level and stacked in a planar geometry. Together with common electronics to control the array, our design takes advantage of emerging micro- fabrication techniques including deep reactive ion etching, laser machining, and wire electrical discharge machining, as well as advanced electronic die assembly and packaging methods. Innovations in packaging combined with etch process steps from the micro-fabrication industry allow for novel instrument builds which will open up the realm of nano sats and cubesat in mapping missions. This paper reviews the combination of manufacturing methods, material combinations and packaging techniques that can be applied to miniaturizing space instrumentation. This work is representative of the next generation of space instruments that will be enablers for smaller and more cost effective missions.
Keywords :
laser beam machining; micromechanical devices; space vehicles; spectrometers; sputter etching; wafer level packaging; wafer-scale integration; FalconSat-3 mission; Johns Hopkins University Applied Physics Laboratory; MEMS; US Air Force Academy; WISPER instrument; deep reactive ion etching; flat plasma spectrometer; laser machining; microelectromechanical systems; microelectronics fabrication; packaging; space science; spacecraft instrument; wafer integrated plasma spectrometer; wafer scale integration; wire electrical discharge machining; Assembly; Electronics packaging; Etching; Fabrication; Instruments; Packaging machines; Plasma applications; Sensor arrays; Spectroscopy; Wafer scale integration;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Aerospace Conference, 2008 IEEE
Conference_Location :
Big Sky, MT
ISSN :
1095-323X
Print_ISBN :
978-1-4244-1487-1
Electronic_ISBN :
1095-323X
Type :
conf
DOI :
10.1109/AERO.2008.4526476
Filename :
4526476
Link To Document :
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