DocumentCode
351494
Title
Photoluminescence parameters in strained GaAs/InxGa1-xAs/GaAs-heterostructures
Author
Grigor´ev, N.N. ; Gule, E.G. ; Klimovskaya, A.I. ; Dryga, Yu.A. ; Litovchenko, V.G.
Author_Institution
Inst. of Semicond. Phys., Acad. of Sci., Kiev, Ukraine
Volume
1
fYear
2000
fDate
2000
Firstpage
281
Abstract
The photoluminescence (PL) of InxGa1-xAs-single quantum wells (QW) grown on GaAs substrate with x ranging between 0.16 and 0.35 was studied. The thickness (d) of QW layers was about or larger than the critical one (d c). The PL parameters were found to depend on a magnitude (d-dc)/dc if d>dc. The heterostructures with QW-thickness d not exceeding the critical one d, meets conditions of homogeneously elastically strained heterostructures almost without defects. The energy levels in QW´s and PL bands (EPL ) in these heterostructures may be described theoretically, and the FWHM of the band approaches its physical limit. The heterostructures with d>dc have a defect concentration (≈1011 cm-2) increasing with the increase of thickness. A large long-range inhomogeneous redistribution of In atoms probably occurs in the highly strained heterostructures
Keywords
III-V semiconductors; gallium arsenide; indium compounds; interface states; interface structure; photoluminescence; semiconductor quantum wells; spectral line breadth; FWHM; GaAs; GaAs substrate; GaAs-InGaAs-GaAs; defect concentration; energy levels; highly strained heterostructures; long-range inhomogeneous redistribution; photoluminescence; single quantum wells; strained GaAs/InxGa1-xAs/GaAs-heterostructures; thickness; Atomic layer deposition; Capacitive sensors; Energy states; Gallium arsenide; Lattices; Light scattering; Morphology; Page description languages; Photoluminescence; Raman scattering;
fLanguage
English
Publisher
ieee
Conference_Titel
Microelectronics, 2000. Proceedings. 2000 22nd International Conference on
Conference_Location
Nis
Print_ISBN
0-7803-5235-1
Type
conf
DOI
10.1109/ICMEL.2000.840574
Filename
840574
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