Title :
Lithography: lasers and optics, what else is there?
Author_Institution :
Sematech, Austin, TX, USA
Abstract :
Summary form only given. Lithography is the means by which circuits are printed onto the silicon wafers. It is a system of equipment and materials, each of which is in itself a complex system. The main elements of the lithographic system are the exposure tool: the camera that images a photosensitive material: the resist. The image is created by light passing through a mask or reticle. This mask/retitle is produced by a separate photographic process utilizing either optical or e-beam exposure of a resist-coated mask blank.
Keywords :
electron beam lithography; electron resists; image sensors; photolithography; photoresists; printed circuits; IC technology; Si; camera; e-beam exposure; electron beam lithography; exposure tool; lasers; lithographic system; masks; optics; photographic process; photolithography; photoresist; photosensitive material; printed circuits; resist-coated mask blank; reticle; silicon wafers; Chemical lasers; Extraterrestrial measurements; Laser excitation; Lithography; Optical diffraction; Optical pumping; Pump lasers; X-ray diffraction; X-ray imaging; X-ray lasers;
Conference_Titel :
Lasers and Electro-Optics, 1998. CLEO 98. Technical Digest. Summaries of papers presented at the Conference on
Conference_Location :
San Francisco, CA, USA
Print_ISBN :
1-55752-339-0
DOI :
10.1109/CLEO.1998.675899
