Structure and morphology of thin Al-layers in resonator´s systems after rapid thermal annealing

The aim of this paper is the study of structure and morphology of Al-layers after rapid thermal annealing (RTA). Al-layers with thickness of 120 nm are prepared on quartz substrates AT-cut. The films are deposited by four different methods: thermal vacuum evaporation, DC magnetron sputtering, RF sputtering and E-beam evaporation. Obtained samples are subjected to RTA in vacuum 6.66.10^-3 Pa. The temperature of the heater is changed from 700°C to 800°C for duration of 5s to 180s. The structural and morphological investigations of the Al layers are carried out by Reflection High-Energy Electron Diffraction (RHEED) with an accelerating voltage of 50 kV and Scanning Electron Microscopy (SEM) on JSM-5300. The morphology and the structure of as-deposited layers are registered. It is established that these two characteristics are varied and depend on the method of deposition. The changes which take place as a result of RTA treatment are studied. The influence of RTA-parameters on morphology and structure depends on the initial state of the layers and can be affected by different grades