DocumentCode :
3516193
Title :
Plane wave transmission response of selectively doped and micromachined silicon wafers under optical illumination
Author :
Lockyer, D.S. ; Vardaxoglou, J.C. ; Kearney, M.J.
Author_Institution :
Dept. of Electron. & Electr. Eng., Loughborough Univ., UK
fYear :
1999
fDate :
1999
Firstpage :
169
Abstract :
The optical manipulation of the transmission properties of selectively doped and micromachined silicon wafers is described. This is achieved by means of optically exciting the silicon and inducing pseudo-conducting plasma. Comparisons between theory and experiment are made and consideration is made of the lossy nature of the plasma
Keywords :
elemental semiconductors; frequency selective surfaces; micromachining; microwave photonics; photoconducting switches; semiconductor plasma; silicon; Si; lossy plasma; micromachined wafers; optical excitation; optical illumination; plane wave transmission response; pseudo-conducting plasma; Apertures; Etching; Frequency selective surfaces; Lighting; Optical arrays; Passband; Plasma applications; Plasma properties; Plasma sources; Silicon;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Microwave Photonics, 1999. MWP '99. International Topical Meeting on
Conference_Location :
Melbourne, Vic.
Print_ISBN :
0-7803-5558-X
Type :
conf
DOI :
10.1109/MWP.1999.819677
Filename :
819677
Link To Document :
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