Improvement of short wavelength optical response by applying multi SiNx:H layers on mono crystalline silicon solar cells

Hydrogen containing silicon nitride film (SiNx:H) is used in most commercial crystalline silicon solar cells as anti-reflection coating and passivation layer. In this study, we have fabricated anti-reflection coating layers which are composed of multi SiNx:H films for mono crystalline silicon solar cell by Plasma Enhanced Chemical Vapor Deposition (PECVD). For high efficiency solar cells, we deposited those layers on various process conditions and compared the reflectance of SiNx:H layer with that of multi SiNx:H layer. Consequently, we optimized deposition condition for multi SiNx:H layer and manufactured black solar cell with a very low reflectance. From these results, we can expect to increase productivity by decreasing processing time. For the characterization of manufactured cell, ellipsometer, quantum efficiency (QE) analyzer and reflecto-meter were used.