• DocumentCode
    3516981
  • Title

    A Study on Coaxial Type DBD Decomposing NO/N2 Mixture Gas by Optical Emission Spectrum

  • Author

    Liu Zhinan ; Cai Yixi ; Wang Jun ; Sun Chuanhong ; Han Wenhe

  • Author_Institution
    Sch. of Automotive & Traffic Eng., Jiangsu Univ., Zhenjiang, China
  • Volume
    1
  • fYear
    2010
  • fDate
    11-12 Nov. 2010
  • Firstpage
    149
  • Lastpage
    153
  • Abstract
    Through establishing a test system of coaxial dielectric barrier discharge type non-thermal plasma reactor, using Q-V Lissajous figure method to measure its electrical parameters, optical emission spectrum of NO/N2 mixed gas system was analyzed, and the effects of the applied voltage peak-peak value(VP-P) on the optical emission spectrum intensity of NO, N2 excited state species were studied when NO/N2 mixture gas passed the reactor´s discharge area. The results showed that high-energy electrons produced by non-thermal plasma played an effective role on the NO, N2 molecules and produced a variety of excited states matters, such as NO(A2Σ+-X2Π), N2(C3Π u→B3Π g); NO(A2Σ+-X2Π) optical emission spectrum strength firstly increased then decreased with the increase of VP-P, N2(C3Πu→B3Πg) optical emission spectrum strength increased with the increase of VP-P; in NO/N2 mixture gas system, NO was removed mainly through the reduction reaction, its removal rate could reach 98%.
  • Keywords
    discharges (electric); dissociation; excited states; gas mixtures; nitrogen; nitrogen compounds; plasma chemistry; plasma diagnostics; plasma transport processes; reduction (chemical); NO-N2; Q-V Lissajous figure method; coaxial dielectric barrier discharge; decomposition; excited state; high-energy electrons; nonthermal plasma reactor; optical emission spectrum intensity; reductive reaction; N2; NO; dielectric barrier discharge; non-thermal plasma; optical emission spectrum;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Optoelectronics and Image Processing (ICOIP), 2010 International Conference on
  • Conference_Location
    Haiko
  • Print_ISBN
    978-1-4244-8683-0
  • Type

    conf

  • DOI
    10.1109/ICOIP.2010.288
  • Filename
    5663275