DocumentCode :
3517059
Title :
The intelligent microelectronics factory of the future
Author :
Larrabee, Graydon B.
Author_Institution :
Texas Instrum., Dallas, TX, USA
fYear :
1991
fDate :
20-22 May 1991
Firstpage :
30
Lastpage :
34
Abstract :
It is projected that semiconductor device manufacturing near the year 2000 will be carried out on silicon wafers as large as 300 mm in diameter. Minimum geometries will approach 0.18 μm for the 1024 Mbit DRAM. Chip (device) sizes will be as large as 450 sq. mm. This will require a new manufacturing paradigm. It is projected that the factory of the future will come very close to actual intelligent microelectronic manufacturing. The factory computer will have dynamic planning and scheduling along with process/equipment diagnosis and prognosis. Cost-effective, highly reliable processing equipment will evolve based on a cluster concept. These computer-intensive, intelligent clusters of process equipment will be linked to the factory computer. The computer will download and change recipes for each wafer. Process control technology of the 1990s will used smart sensors in the equipment to drive the process to the target value. Model predictive process control with feedback and feedforward will replace traditional statistical process control
Keywords :
CAD/CAM; integrated circuit manufacture; manufacturing computer control; process computer control; scheduling; technological forecasting; 0.18 micron; 1024 Mbit; 300 mm; DRAM; cluster concept; dynamic planning; feedback; feedforward; intelligent microelectronics factory of the future; manufacturing paradigm; minimum geometries; model predictive process control; process/equipment diagnosis; scheduling; semiconductor device manufacturing; silicon wafers; smart sensors; wafer diameter; Competitive intelligence; Geometry; Intelligent sensors; Microelectronics; Process control; Production facilities; Random access memory; Semiconductor device manufacture; Semiconductor devices; Silicon;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Semiconductor Manufacturing Science Symposium, 1991. ISMSS 1991., IEEE/SEMI International
Conference_Location :
Burlingame, CA
Print_ISBN :
0-7803-0027-0
Type :
conf
DOI :
10.1109/ISMSS.1991.146262
Filename :
146262
Link To Document :
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