DocumentCode
3517624
Title
The dielectric properties of functional PVDF thin films by physical vapor deposition method
Author
Park, Su-Hong ; Lim, Eung-Choon ; Park, Kang-Shih ; Kang, Dae-Ha ; Han, Sang-Ok ; Lee, Duck-Chool
Author_Institution
Inha Univ., Inchon, South Korea
Volume
2
fYear
1997
fDate
25 -30 May 1997
Firstpage
1144
Abstract
PVDF thin films were fabricated by physical vapor deposition (PVD). The effect of incremental increases of applied electric field on the dielectric constant is related to the one directional array molecular structure. The dielectric absorption moves to higher frequencies with increasing specimen temperature, in accordance with Debye theory
Keywords
dielectric losses; dielectric polarisation; permittivity; piezoelectric thin films; polymer films; polymer structure; vapour deposition; β form; Debye theory; applied electric field increases; dielectric absorption; dielectric constant; dielectric dissipation factor; dielectric properties; functional PVDF thin films; one directional array molecular structure; physical vapor deposition; piezoelectric; spontaneous polarization; temperature dependence; Chemical vapor deposition; Dielectric constant; Dielectric materials; Dielectric thin films; Frequency; Piezoelectric polarization; Polymers; Sputtering; Substrates; Temperature;
fLanguage
English
Publisher
ieee
Conference_Titel
Properties and Applications of Dielectric Materials, 1997., Proceedings of the 5th International Conference on
Conference_Location
Seoul
Print_ISBN
0-7803-2651-2
Type
conf
DOI
10.1109/ICPADM.1997.616651
Filename
616651
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