• DocumentCode
    3517806
  • Title

    Manufacturing lithography value/cost analysis

  • Author

    Bigelow, Mark G. ; Beek, P.T.

  • Author_Institution
    ASM-Lithography, Tempe, AZ, USA
  • fYear
    1991
  • fDate
    20-22 May 1991
  • Firstpage
    44
  • Lastpage
    54
  • Abstract
    A long-term value/cost of ownership model is presented which examines those parameters which most significantly differentiate lithography equipment and influence product innovation and productivity. These parameters are stepper throughput, overlay, yield, utilization, process automation, and a future technology path. Available market specifications for these stepper parameters are used in the model for comparison. It is concluded that flexible upgradeable high-throughput steppers operating simultaneously at full performance specification result in the lowest manufacturing cost per good die
  • Keywords
    economics; integrated circuit manufacture; lithography; flexible upgradeable high-throughput steppers; future technology path; lithography equipment; long-term value/cost of ownership model; manufacturing cost per good die; market specifications; overlay; process automation; product innovation; productivity; stepper throughput; value/cost analysis; yield; Cost function; Finance; Lithography; Load management; Manufacturing automation; Microelectronics; Productivity; Semiconductor device modeling; Technological innovation; Throughput;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Semiconductor Manufacturing Science Symposium, 1991. ISMSS 1991., IEEE/SEMI International
  • Conference_Location
    Burlingame, CA
  • Print_ISBN
    0-7803-0027-0
  • Type

    conf

  • DOI
    10.1109/ISMSS.1991.146265
  • Filename
    146265