• DocumentCode
    3518016
  • Title

    Photolithographically manufactured acrylate polymer multimode optical waveguide loss design rules

  • Author

    Wang, Kai ; Selviah, David R. ; Papakonstantinou, Ioannis ; Yu, Guoyu ; Baghsiahi, Hadi ; Fernández, F. Aníbal

  • Author_Institution
    Dept. of Electron. & Electr. Eng., UCL, London
  • fYear
    2008
  • fDate
    1-4 Sept. 2008
  • Firstpage
    1251
  • Lastpage
    1256
  • Abstract
    This paper describes how design rules are established for photolithographically manufactured acrylate polymer optical multimode waveguide components by optical experimental measurements made on the manufactured waveguide component. The loss of individual waveguide components, such as straight sections, 90deg bends, crossings, tapers and tapered bends must be known so that the combined loss of a cascade of such elements can be found to determine whether the interconnectionpsilas optical power budget is sufficient to achieve a good bit error rate. However, the loss depends on several factors: the materials: the polymer used for the core and for the cladding, the fabrication technique: e.g. the photolithographic procedure and the precise temperature baking regime used, and the measurement technique: the optical source lateral size and angular divergence and precise position relative to the entrance of the waveguide, the output detector lateral size, its angular acceptance angle (if any) and its precise position relative to the exit of the waveguide. The experiments reported on photolithographically manufactured acrylate polymer multimode waveguide were performed at room temperature. A new technique for measure the transmitted power at waveguide crossings is reported for the first time.
  • Keywords
    error statistics; optical design techniques; optical fabrication; optical losses; optical polymers; optical waveguide components; optical waveguides; photolithography; waveguide discontinuities; 90deg waveguide bends; acrylate polymer; bit error rate; multimode optical waveguide loss design; photolithography; straight section; temperature 293 K to 298 K; waveguide components; waveguide crossings; waveguide tapers; Bit error rate; Optical design; Optical devices; Optical interconnections; Optical losses; Optical materials; Optical polymers; Optical waveguide components; Optical waveguides; Pulp manufacturing;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electronics System-Integration Technology Conference, 2008. ESTC 2008. 2nd
  • Conference_Location
    Greenwich
  • Print_ISBN
    978-1-4244-2813-7
  • Electronic_ISBN
    978-1-4244-2814-4
  • Type

    conf

  • DOI
    10.1109/ESTC.2008.4684533
  • Filename
    4684533