Evaluation of thin-film chamber-type stimulation microelectrodes

Microelectrodes presently used for chronic intracortical stimulation have difficulty in maintaining sufficient current and charge densities to functionally stimulate without irreparable damage to the electrode or tissue. With recent advances in solid-state technology, a chamber-type microelectrode has been fabricated to overcome these problems. The design is based on an improved geometrical configuration and differential current density theory. Comparative in vitro stimulation experiments and computer modeling were utilized to evaluate and optimize the design. The realization of an improved microelectrode for stimulation has been demonstrated.<>