• DocumentCode
    3518176
  • Title

    Detailed analysis of the gate delay variability in partially depleted SOI CMOS circuits

  • Author

    Aller, I. ; Kroell, K.E.

  • Author_Institution
    IBM Entwicklung GmbH, Boeblingen, Germany
  • fYear
    1999
  • fDate
    4-7 Oct. 1999
  • Firstpage
    40
  • Lastpage
    41
  • Abstract
    Circuit design using partially depleted (PD) SOI FETs must take into account a variable gate delay which is dependent on the switching history of the circuits (Gautier et al, 1997; Houston and Unnikrishnan, 1998). In order to fully exploit the advantages of SOI, it is important to understand and analyze such ´history effects´ and consider them for an optimized design strategy. In this paper, we describe a methodology suitable to analyze PD SOI CMOS circuits, including a new algorithm for dynamic equilibrium computations, a task that is not practicable with standard circuit simulators because of the very slow evolution of the body potential (time constants up to ms (Assaderaghi et al., 1996)). Simulation results for a 0.2 /spl mu/m technology are given, showing the importance of design and application parameters with regard to the history effect.
  • Keywords
    CMOS integrated circuits; MOSFET; circuit optimisation; circuit simulation; delays; integrated circuit design; silicon-on-insulator; 0.2 micron; PD SOI CMOS circuits; SOI; Si-SiO/sub 2/; application parameters; body potential; circuit design; circuit simulators; circuit switching history; design parameters; dynamic equilibrium computation algorithm; gate delay variability; history effects; optimized design strategy; partially depleted SOI CMOS circuits; partially depleted SOI FETs; simulation; time constants; variable gate delay; Algorithm design and analysis; Circuit simulation; Circuit synthesis; Computational modeling; Delay; Design optimization; FETs; Heuristic algorithms; History; Switching circuits;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    SOI Conference, 1999. Proceedings. 1999 IEEE International
  • Conference_Location
    Rohnert Park, CA, USA
  • ISSN
    1078-621X
  • Print_ISBN
    0-7803-5456-7
  • Type

    conf

  • DOI
    10.1109/SOI.1999.819848
  • Filename
    819848