Title :
Self-assembly of CdS nanocrystals obtained by Langmuir-Blodgett technique on the SiO2 surface
Author :
Svit, Kirill A. ; Zhuravlev, Konstantin S.
Author_Institution :
Rzhanov Inst. of Semicond. Phys., Novosibirsk, Russia
fDate :
June 29 2015-July 3 2015
Abstract :
Self-assembly of CdS nanocrystals during evaporation of Langmuir-Blodgett matrix on the silica surface was investigated. Information about the size and spatial distribution of self-assembled nanocrystal ensembles were obtained using atomic force microscopy. It was found that matrix annealing temperature strongly affect self-assembly pattern. At annealing temperatures within the range of 175-200°C self-assembly mainly determined by vad der Waals forces between the nanocrystals resulting in formation of three-dimensional ensembles. With annealing temperature increase NC tend to spread evenly on the substrate surface create due to increase on capillary forces influence on self-assembly process.
Keywords :
II-VI semiconductors; Langmuir-Blodgett films; annealing; atomic force microscopy; cadmium compounds; nanofabrication; nanostructured materials; self-assembly; semiconductor growth; vacuum deposition; wide band gap semiconductors; CdS; Langmuir-Blodgett technique; SiO2; annealing temperature; atomic force microscopy; cadmium sulfide nanocrystals; capillary forces; evaporation; self-assembly pattern; silica surface; size distribution; spatial distribution; substrate surface; temperature 175 degC to 200 degC; vad der Waals forces; Annealing; Assembly; Matrix decomposition; Nanocrystals; Self-assembly; Substrates; Surface treatment; Langmuir-Blodgett; Nanocrystals; cadmium sulfide; self-assembly;
Conference_Titel :
Micro/Nanotechnologies and Electron Devices (EDM), 2015 16th International Conference of Young Specialists on
Conference_Location :
Erlagol
Print_ISBN :
978-1-4673-6718-9
DOI :
10.1109/EDM.2015.7184490