DocumentCode
3519059
Title
Optimization of growth and device performance for InAs quantum dot solar cells
Author
Hubbard, Seth M. ; Bennett, Mitchell ; Podell, Adam ; Forbes, David V.
Author_Institution
NanoPower Res. Labs., Rochester Inst. of Technol., Rochester, NY, USA
fYear
2012
fDate
3-8 June 2012
Abstract
Substrate misorientation was investigated as a mechanism to control InAs quantum dot density and size. Results have shown that both 2° and 6° substrate misorientation toward the <;110>; direction can lead to high InAs QD density (4.8×1010 cm-2) as well as suppress QD ripening. In the 6° misoriented samples the critical thickness for QD formation was higher than in the 2° misoriented samples (1.9 ML versus 1.7-1.8ML, respectively). Substrate misorientation also shows that smaller QDs can be grown by increasing misorientation. GaAs solar cells with a 10 layer QD superlattice were also investigated as a function of misorientation angle and InAs coverage. On the 2° substrate, short circuit current (23.3 mA/cm2) was improved over 2° baseline samples. The EQE versus InAs coverage shows that quantum confined absorption and collection is complex, with coupling between wetting layer and excited state levels in the QD. QD contributed short circuit current density for the 2° misorientation substrates was calculated form EQE as 0.027 mA/cm2 per QD layer while the 6° misorientation substrates gave 0.019 mA/cm2 per QD layer.
Keywords
III-V semiconductors; current density; excited states; indium compounds; semiconductor quantum dots; solar cells; InAs; QD ripening; QD superlattice; critical thickness; device performance; excited state levels; misorientation angle; quantum confined absorption; quantum dot solar cells; short circuit current density; substrate misorientation; wetting layer; Gallium arsenide; Photovoltaic cells; Short circuit currents; Stationary state; Strain; Substrates; Superlattices; InAs; epitaxy; quantum dot solar cell; substrate misorientation;
fLanguage
English
Publisher
ieee
Conference_Titel
Photovoltaic Specialists Conference (PVSC), 2012 38th IEEE
Conference_Location
Austin, TX
ISSN
0160-8371
Print_ISBN
978-1-4673-0064-3
Type
conf
DOI
10.1109/PVSC.2012.6317940
Filename
6317940
Link To Document