DocumentCode
3519571
Title
Excimer lasers for DUV lithography
Author
Watson, Thomas
Author_Institution
Cymer Inc., San Diego, CA, USA
fYear
1998
fDate
3-8 May 1998
Firstpage
122
Abstract
Summary form only given. The use of KrF and ArF excimer lasers as exposure sources for deep ultraviolet (DUV) lithography is discussed. Driven by extreme demands on performance, these lasers continually push the state-of-the-art in excimer laser design. Past, present, and future performance characteristics for these lasers are presented.
Keywords
X-ray lithography; argon compounds; excimer lasers; krypton compounds; laser beam applications; photolithography; ArF; ArF excimer lasers; DUV lithography; KrF; KrF excimer lasers; deep ultraviolet lithography; excimer laser design; excimer lasers; exposure sources; performance characteristics; Atomic beams; Ionization; Laboratories; Laser modes; Laser theory; Lithography; Optical materials; Resists; Schrodinger equation; Tunneling;
fLanguage
English
Publisher
ieee
Conference_Titel
Lasers and Electro-Optics, 1998. CLEO 98. Technical Digest. Summaries of papers presented at the Conference on
Conference_Location
San Francisco, CA, USA
Print_ISBN
1-55752-339-0
Type
conf
DOI
10.1109/CLEO.1998.675948
Filename
675948
Link To Document