• DocumentCode
    3520086
  • Title

    Vacuum ultraviolet rare-gas excimer emissions initiated by high-intensity-laser-produced electrons

  • Author

    Kubodera, S. ; Kawamaka, J. ; Sasaki, W.

  • Author_Institution
    Dept. of Electr. & Electron. Eng., Miyazaki Univ., Japan
  • fYear
    1998
  • fDate
    3-8 May 1998
  • Firstpage
    148
  • Lastpage
    149
  • Abstract
    Summary form only given. We have demonstrated rare-gas excimer production using a tabletop femtosecond high-intensity laser as an excitation source. High-intensity-laser-produced electrons via optical-field-induced ionization (OFI) make themselves analogous to the electron-beam produced plasma electrons. For example, electron temperature produced by the OFI can be controlled by ionizing laser parameters such as polarization, wavelength, and focused intensity. If the initial plasma conditions of the electron beam excitation are fulfilled by using a femtosecond-laser-produced plasma, a tabletop repetitive VUV rare-gas excimer lasers could be operated in a more practical fashion.
  • Keywords
    X-ray lasers; electron beam pumping; excimer lasers; photoionisation; plasma production by laser; plasma temperature; electron beam pumped lasers; electron temperature; electron-beam produced plasma electrons; excitation source; femtosecond-laser-produced plasma; focused intensity; high-intensity-laser-produced electrons; initial plasma conditions; ionizing laser parameters; optical-field-induced ionization; polarization; rare-gas excimer production; tabletop femtosecond high-intensity laser; tabletop repetitive VUV rare-gas excimer lasers; vacuum ultraviolet rare-gas excimer emissions; wavelength; Electron optics; Ionization; Laser excitation; Optical control; Plasma sources; Plasma temperature; Plasma waves; Production; Stimulated emission; Ultrafast optics;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Lasers and Electro-Optics, 1998. CLEO 98. Technical Digest. Summaries of papers presented at the Conference on
  • Conference_Location
    San Francisco, CA, USA
  • Print_ISBN
    1-55752-339-0
  • Type

    conf

  • DOI
    10.1109/CLEO.1998.675980
  • Filename
    675980