• DocumentCode
    3520451
  • Title

    Low K CMOS90 2N gold wire bonding process development

  • Author

    Han, Ming-Chuan ; Yan, Bei-Yue

  • Author_Institution
    Freescale Semicond. (China), Ltd., Tianjin, China
  • fYear
    2009
  • fDate
    10-13 Aug. 2009
  • Firstpage
    737
  • Lastpage
    741
  • Abstract
    The electronics industry is mainly driven by the demand for smaller, faster, higher complexity, more reliable and cheaper device. Reduction in bond pad patch and low K wafer were introduced into mass production for miniaturation and signal transmission integrity. High safety requirement and longer working life demand high reliability performance especially in automotive and aerospace filed. Although trends in electronic packing have been focused on the development of flip chip, Wire bonding still cements its position in chip interconnection technology. In IC assembly, gold wire is the key material in wire bonding process to connect chip to substrate. 2N gold wire with specific dopant is applied in many types of package for stringent reliability requirement field. This study will focus on 2N gold wire application in wire bonding process.
  • Keywords
    electronics industry; gold; lead bonding; Au; electronic packing; electronics industry; low K CMOS90 2N gold wire bonding process development; mass production; Aerospace materials; Aerospace safety; Automotive engineering; Bonding processes; Electronics industry; Flip chip; Gold; Mass production; Wafer bonding; Wire;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Electronic Packaging Technology & High Density Packaging, 2009. ICEPT-HDP '09. International Conference on
  • Conference_Location
    Beijing
  • Print_ISBN
    978-1-4244-4658-2
  • Electronic_ISBN
    978-1-4244-4659-9
  • Type

    conf

  • DOI
    10.1109/ICEPT.2009.5270652
  • Filename
    5270652