DocumentCode
3520591
Title
The effect of compact modelling strategy on SNM and Read Current variability in Modern SRAM
Author
Asenov, P. ; Adamu-Lema, F. ; Roy, S. ; Millar, C. ; Asenov, A. ; Roy, G. ; Kovac, U. ; Reid, D.
Author_Institution
Sch. on Eng., Univ. of Glasgow, Glasgow, UK
fYear
2011
fDate
8-10 Sept. 2011
Firstpage
283
Lastpage
286
Abstract
It has been shown that sub 100nm SRAM is particularly sensitive to stochastic device variability. In this paper we consider two correlated figures of merit for SRAM, Static Noise Margin (SNM) and Read Current. For the purposes of this paper 1,000 3D atomistic simulations of microscopically different 25nm P and N bulk MOSFETs were performed, and statistical compact models were then extracted for each device. Using these models simulations are performed to calculate the SNM and Read Current distributions of SRAM cells constructed using devices from the device ensemble. Variability in device performance has been then introduced via Gaussian or skewed Gaussian threshold voltages (Vt) and by using values of Vt extracted directly from the individual device compact models and the results of these simulations are then compared to the baseline simulations using fully extracted models. The results clearly demonstrate the errors that can be introduced in the estimation of SNM and Read Current distribution of a 6T SRAM cell when statistical device variability is not correctly modelled.
Keywords
MOSFET; SRAM chips; integrated circuit modelling; stochastic processes; 3D atomistic simulation; 6T SRAM cell; N bulk MOSFET; P bulk MOSFET; SNM; compact modelling strategy; read current distribution; read current variability; size 100 nm; size 25 nm; skewed Gaussian threshold voltage; static noise margin; statistical device variability; stochastic device variability; Computational modeling; Current distribution; Data models; Integrated circuit modeling; Performance evaluation; Random access memory; Solid modeling; Compact Model Extraction; RandomSpice; SNM; Statistical Variability;
fLanguage
English
Publisher
ieee
Conference_Titel
Simulation of Semiconductor Processes and Devices (SISPAD), 2011 International Conference on
Conference_Location
Osaka
ISSN
1946-1569
Print_ISBN
978-1-61284-419-0
Type
conf
DOI
10.1109/SISPAD.2011.6035024
Filename
6035024
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