• DocumentCode
    3520636
  • Title

    Schottky-barrier change by structural disorders at metal/Si interfaces: First-principles study

  • Author

    Kobinata, Kyosuke ; Nakayama, Takashi

  • Author_Institution
    Dept. of Phys., Chiba Univ., Chiba, Japan
  • fYear
    2011
  • fDate
    8-10 Sept. 2011
  • Firstpage
    295
  • Lastpage
    298
  • Abstract
    Schottky-barrier changes by structural disorders are studied using the first-principles calculation and adopting Au/Si interface. It is shown that the structural disorders prefer to locate near the interface, but the penetration depth of the MIGS into Si is about 5 Si layers similar to clean interface even when disorders exist Reflecting such penetration, Schottky barrier for holes shows little change in cases of Si vacancy and Au substitution, while it increases in cases of Si and Au interstitials due to the presence of Si dangling bonds.
  • Keywords
    Schottky barriers; ab initio calculations; dangling bonds; elemental semiconductors; gold; interstitials; semiconductor-metal boundaries; silicon; vacancies (crystal); Au-Si; MIGS; Schottky-barrier changes; dangling bonds; first-principle calculation; interstitials; metal induced gap state; metal-semiconductor interface; penetration depth; structural disorders; vacancy; Atomic layer deposition; Gold; Silicon;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Simulation of Semiconductor Processes and Devices (SISPAD), 2011 International Conference on
  • Conference_Location
    Osaka
  • ISSN
    1946-1569
  • Print_ISBN
    978-1-61284-419-0
  • Type

    conf

  • DOI
    10.1109/SISPAD.2011.6035027
  • Filename
    6035027