DocumentCode
3520636
Title
Schottky-barrier change by structural disorders at metal/Si interfaces: First-principles study
Author
Kobinata, Kyosuke ; Nakayama, Takashi
Author_Institution
Dept. of Phys., Chiba Univ., Chiba, Japan
fYear
2011
fDate
8-10 Sept. 2011
Firstpage
295
Lastpage
298
Abstract
Schottky-barrier changes by structural disorders are studied using the first-principles calculation and adopting Au/Si interface. It is shown that the structural disorders prefer to locate near the interface, but the penetration depth of the MIGS into Si is about 5 Si layers similar to clean interface even when disorders exist Reflecting such penetration, Schottky barrier for holes shows little change in cases of Si vacancy and Au substitution, while it increases in cases of Si and Au interstitials due to the presence of Si dangling bonds.
Keywords
Schottky barriers; ab initio calculations; dangling bonds; elemental semiconductors; gold; interstitials; semiconductor-metal boundaries; silicon; vacancies (crystal); Au-Si; MIGS; Schottky-barrier changes; dangling bonds; first-principle calculation; interstitials; metal induced gap state; metal-semiconductor interface; penetration depth; structural disorders; vacancy; Atomic layer deposition; Gold; Silicon;
fLanguage
English
Publisher
ieee
Conference_Titel
Simulation of Semiconductor Processes and Devices (SISPAD), 2011 International Conference on
Conference_Location
Osaka
ISSN
1946-1569
Print_ISBN
978-1-61284-419-0
Type
conf
DOI
10.1109/SISPAD.2011.6035027
Filename
6035027
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