• DocumentCode
    3521035
  • Title

    Analytical model of drain current in nanowire MOSFETs including quantum confinement, band structure effects and quasi-ballistic transport: device to circuit performances analysis

  • Author

    Dura, J. ; Martinie, S. ; Munteanu, D. ; Triozon, F. ; Barraud, S. ; Niquet, Y.M. ; Autran, J.L.

  • Author_Institution
    Inst. for Nanosci. & Cryogenics (INAC), CEA-LETI MINATEC, Grenoble, France
  • fYear
    2011
  • fDate
    8-10 Sept. 2011
  • Firstpage
    43
  • Lastpage
    46
  • Abstract
    This paper presents an analytical model of the drain current in nanowire MOSFETs (Fig. 1). This architecture is aimed for ultra-scaled devices up to technology nodes sub-11nm and uses silicon films of a few nanometers in thickness. At these dimensions, some emerging physical phenomena can no more be neglected: short-channel effects (SCE) and quasi-ballistic transport (both due to the channel length reduction) and quantum confinement and band structure effects (BSE), due to the strong silicon nanowire thinning. Our analytical model of the drain current includes all these physical phenomena. The proposed model is compared and validated on numerical simulations and experimental data. Finally, a study at the circuit level is performed to assess the impact of BSE and quasi-ballistic transport on the performances of small circuits such as CMOS inverters and ring oscillators based on ultimate nanowire MOSFETs.
  • Keywords
    MOSFET; ballistic transport; band structure; elemental semiconductors; nanoelectronics; nanowires; semiconductor device models; semiconductor thin films; silicon; BSE impact; CMOS inverter; band structure effect; circuit performances analysis; drain current; nanowire MOSFET; quantum confinement; quasiballistic transport; ring oscillator; short channel effect; silicon nanowire thinning; ultrascaled device; Analytical models; Inverters; MOSFETs; Numerical models; Numerical simulation; Oscillators; Silicon; Nanowire MOSFET; band structure effect; modeling; quantum confinement; quasi-ballistic transport;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Simulation of Semiconductor Processes and Devices (SISPAD), 2011 International Conference on
  • Conference_Location
    Osaka
  • ISSN
    1946-1569
  • Print_ISBN
    978-1-61284-419-0
  • Type

    conf

  • DOI
    10.1109/SISPAD.2011.6035045
  • Filename
    6035045