• DocumentCode
    3521150
  • Title

    The investigation on the quality of aluminum rear emitter for n-type solar cells

  • Author

    Wu, Wenjuan ; Xi, Xi ; Chen, Liping ; Gao, Feng ; Xu, Jin ; Wang, Zhengxin ; Yu, Zhenqiu ; Lu, Qian ; Zhang, Song ; Zhu, Haidong ; Chen, Rulong ; Yang, Jian ; Ji, Jingjia ; Shi, Zhengrong

  • Author_Institution
    Suntech Power Co., Ltd., Wuxi, China
  • fYear
    2012
  • fDate
    3-8 June 2012
  • Abstract
    Since rear emitter characterization is the crucial factor for aluminum back junction n-type cells, the emphasis of this paper is focused on the quality of this Al-Si alloy layer. Diffusion profile test is used to describe the diffusion of Al in the silicon rear side. It is found that the Al-Si alloy layer´s thickness of about 6 μm should be better. In order to get a thicker thickness, a higher temperature or a slow belt velocity is needed in the firing process. However, it is found that a higher temperature is not suitable, which will cause a higher concentration of Al atoms in the layer. A lower firing speed almost only thickens the alloy layer. A high Voc of 650 mV and a high fill factor of 0.818 have been obtained by slowing down the firing speed.
  • Keywords
    aluminium alloys; diffusion; elemental semiconductors; firing (materials); silicon; solar cells; Al-Si; N-type solar cell; aluminum back junction n-type cell; diffusion profile test; firing process; rear emitter; voltage 650 mV; Europe; Silicon compounds; Al-Si Alloy Layer; Aluminum rear emitter; N -type solar cells;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Photovoltaic Specialists Conference (PVSC), 2012 38th IEEE
  • Conference_Location
    Austin, TX
  • ISSN
    0160-8371
  • Print_ISBN
    978-1-4673-0064-3
  • Type

    conf

  • DOI
    10.1109/PVSC.2012.6318052
  • Filename
    6318052