DocumentCode :
3521150
Title :
The investigation on the quality of aluminum rear emitter for n-type solar cells
Author :
Wu, Wenjuan ; Xi, Xi ; Chen, Liping ; Gao, Feng ; Xu, Jin ; Wang, Zhengxin ; Yu, Zhenqiu ; Lu, Qian ; Zhang, Song ; Zhu, Haidong ; Chen, Rulong ; Yang, Jian ; Ji, Jingjia ; Shi, Zhengrong
Author_Institution :
Suntech Power Co., Ltd., Wuxi, China
fYear :
2012
fDate :
3-8 June 2012
Abstract :
Since rear emitter characterization is the crucial factor for aluminum back junction n-type cells, the emphasis of this paper is focused on the quality of this Al-Si alloy layer. Diffusion profile test is used to describe the diffusion of Al in the silicon rear side. It is found that the Al-Si alloy layer´s thickness of about 6 μm should be better. In order to get a thicker thickness, a higher temperature or a slow belt velocity is needed in the firing process. However, it is found that a higher temperature is not suitable, which will cause a higher concentration of Al atoms in the layer. A lower firing speed almost only thickens the alloy layer. A high Voc of 650 mV and a high fill factor of 0.818 have been obtained by slowing down the firing speed.
Keywords :
aluminium alloys; diffusion; elemental semiconductors; firing (materials); silicon; solar cells; Al-Si; N-type solar cell; aluminum back junction n-type cell; diffusion profile test; firing process; rear emitter; voltage 650 mV; Europe; Silicon compounds; Al-Si Alloy Layer; Aluminum rear emitter; N -type solar cells;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Photovoltaic Specialists Conference (PVSC), 2012 38th IEEE
Conference_Location :
Austin, TX
ISSN :
0160-8371
Print_ISBN :
978-1-4673-0064-3
Type :
conf
DOI :
10.1109/PVSC.2012.6318052
Filename :
6318052
Link To Document :
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