DocumentCode :
3521162
Title :
Wigner Monte Carlo approach to quantum and dissipative transport in Si-MOSFETs
Author :
Koba, Shunsuke ; Tsuchiya, Hideaki ; Ogawa, Matsuto
Author_Institution :
Dept. of Electr. & Electron. Eng., Kobe Univ., Kobe, Japan
fYear :
2011
fDate :
8-10 Sept. 2011
Firstpage :
79
Lastpage :
82
Abstract :
We investigate the influences of quantum transport and scattering effects in Si double-gate MOSFETs based on Wigner Monte Carlo (WMC) approach. It is shown that quantum reflection effect makes significant differences in microscopic features of electron transport between classical and quantum approaches and can even reduce drain current at on-state, but it does not necessarily produce drastic change in macroscopic properties including the drain current. On the other hand, source-drain direct tunneling crucially degrades the subthreshold properties in scaled MOSFETs with sub-10 nm gate length. Furthermore, the ability of the WMC method to describe quantum-classical transition of carrier transport is demonstrated.
Keywords :
MOSFET; Monte Carlo methods; elemental semiconductors; quantum theory; semiconductor device models; silicon; Si; Si-MOSFET; WMC method; Wigner Monte Carlo Approach; dissipative transport; double-gate MOSFET; drain current; electron transport; macroscopic properties; quantum reflection effect; quantum transport; quantum-classical transition; scattering effect; source-drain direct tunneling; subthreshold properties; Distribution functions; Logic gates; MOSFETs; Monte Carlo methods; Reflection; Scattering; Tunneling; Quantum reflection; Wigner Monte-Carlo approach; quantum-classical transition; tunneling;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Simulation of Semiconductor Processes and Devices (SISPAD), 2011 International Conference on
Conference_Location :
Osaka
ISSN :
1946-1569
Print_ISBN :
978-1-61284-419-0
Type :
conf
DOI :
10.1109/SISPAD.2011.6035054
Filename :
6035054
Link To Document :
بازگشت