• DocumentCode
    3521227
  • Title

    The Non-equilibrium Green function approach as a TCAD tool for future CMOS technology

  • Author

    Martinez, Antonio ; Seoane, Natalia ; Aldegunde, Manuel ; Asenov, Asen ; Barker, John R.

  • Author_Institution
    Coll. of Eng., Univ. of Swansea, Swansea, UK
  • fYear
    2011
  • fDate
    8-10 Sept. 2011
  • Firstpage
    95
  • Lastpage
    98
  • Abstract
    The potential of the Non-equilibrium Green function formalism as a new TCAD tool is demonstrated with concrete examples. We revise ballistic simulations of variability associated with discrete dopants and SiO2/Si interface roughness of silicon gate-all-around nanowire transistors. Phonon limited mobility in various nanowire cross-sections are calculated from the current-voltage characteristics, showing an agreement with previous calculations using different models. Using the same electron-phonon parameters, statistical simulations combining discrete dopants and surface roughness are carried out for a nanowire transistor. The use of renormalized physics in the formalism is highlighted. The majority of results use a coupled-mode-space representation in concomitance with a recursive algorithm to deliver fast and accurate results, even with the inclusion of dissipative physics.
  • Keywords
    Green´s function methods; MOSFET; carrier mobility; electron-phonon interactions; nanoelectronics; nanowires; statistical analysis; surface roughness; technology CAD (electronics); CMOS technology; TCAD tool; ballistic simulation; coupled-mode-space representation; current-voltage characteristics; discrete dopant; electron-phonon parameters; nanowire cross-section; nonequilibrium Green´s function approach; phonon limited mobility; recursive algorithm; silicon gate-all-around nanowire transistor; statistical simulation; surface roughness; Phonons; Rough surfaces; Scattering; Silicon; Surface roughness; Transistors; Tunneling; NEGF; Phonon scattering; Random discrete dopants; Silicon Nanowire transistors; Surface roughness;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Simulation of Semiconductor Processes and Devices (SISPAD), 2011 International Conference on
  • Conference_Location
    Osaka
  • ISSN
    1946-1569
  • Print_ISBN
    978-1-61284-419-0
  • Type

    conf

  • DOI
    10.1109/SISPAD.2011.6035058
  • Filename
    6035058