Title :
The Non-equilibrium Green function approach as a TCAD tool for future CMOS technology
Author :
Martinez, Antonio ; Seoane, Natalia ; Aldegunde, Manuel ; Asenov, Asen ; Barker, John R.
Author_Institution :
Coll. of Eng., Univ. of Swansea, Swansea, UK
Abstract :
The potential of the Non-equilibrium Green function formalism as a new TCAD tool is demonstrated with concrete examples. We revise ballistic simulations of variability associated with discrete dopants and SiO2/Si interface roughness of silicon gate-all-around nanowire transistors. Phonon limited mobility in various nanowire cross-sections are calculated from the current-voltage characteristics, showing an agreement with previous calculations using different models. Using the same electron-phonon parameters, statistical simulations combining discrete dopants and surface roughness are carried out for a nanowire transistor. The use of renormalized physics in the formalism is highlighted. The majority of results use a coupled-mode-space representation in concomitance with a recursive algorithm to deliver fast and accurate results, even with the inclusion of dissipative physics.
Keywords :
Green´s function methods; MOSFET; carrier mobility; electron-phonon interactions; nanoelectronics; nanowires; statistical analysis; surface roughness; technology CAD (electronics); CMOS technology; TCAD tool; ballistic simulation; coupled-mode-space representation; current-voltage characteristics; discrete dopant; electron-phonon parameters; nanowire cross-section; nonequilibrium Green´s function approach; phonon limited mobility; recursive algorithm; silicon gate-all-around nanowire transistor; statistical simulation; surface roughness; Phonons; Rough surfaces; Scattering; Silicon; Surface roughness; Transistors; Tunneling; NEGF; Phonon scattering; Random discrete dopants; Silicon Nanowire transistors; Surface roughness;
Conference_Titel :
Simulation of Semiconductor Processes and Devices (SISPAD), 2011 International Conference on
Conference_Location :
Osaka
Print_ISBN :
978-1-61284-419-0
DOI :
10.1109/SISPAD.2011.6035058