DocumentCode
3521391
Title
Direct-write techniques for maskless production of microelectronics: A review of current state-of-the-art technologies
Author
Zhang, Yan ; Liu, Changqing ; Whalley, David
Author_Institution
Wolfson Sch. of Mech. & Manuf. Eng., Loughborough Univ., Loughborough, UK
fYear
2009
fDate
10-13 Aug. 2009
Firstpage
497
Lastpage
503
Abstract
Recently, there has been growing interest in direct-write methods for the manufacturing of microelectronic products, as the entire electronics industry sector is aiming towards low cost, rapid manufacturing and shorter time-to-market, as well as reduced environmental impacts. This paper will review the main direct-write techniques, most of which have been invented or seen significant development during the last decade. These techniques include droplet-based direct writing, such as inkjet printing, filament-based direct writing, such as the Micropen and nScrypt processes, tip based direct-write methods, and laser beam direct writing. For each category, only a few examples are presented, although there are a number of specific methods and variants within each of these categories.
Keywords
integrated circuit manufacture; laser beam applications; rapid prototyping (industrial); time to market; Micropen process; current state-of-the-art technologies; direct-write techniques; droplet-based direct writing; laser beam direct writing; maskless production; microelectronic products manufacturing; nScrypt process; rapid manufacturing; time-to-market; tip based direct-write methods; Computer aided manufacturing; Conducting materials; Costs; Etching; Lithography; Manufacturing processes; Microelectronics; Production; Resists; Writing;
fLanguage
English
Publisher
ieee
Conference_Titel
Electronic Packaging Technology & High Density Packaging, 2009. ICEPT-HDP '09. International Conference on
Conference_Location
Beijing
Print_ISBN
978-1-4244-4658-2
Electronic_ISBN
978-1-4244-4659-9
Type
conf
DOI
10.1109/ICEPT.2009.5270702
Filename
5270702
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