DocumentCode :
3521409
Title :
Diamond bit cutting for processing high topography wafers
Author :
Agarwal, R. ; Pham, N. ; Cotrin, R. ; Andrei, A. ; Ruythooren, W. ; Iker, F. ; Soussan, P.
Author_Institution :
IMEC, Leuven, Belgium
fYear :
2009
fDate :
9-11 Dec. 2009
Firstpage :
267
Lastpage :
271
Abstract :
In this paper we report the results of diamond bit cutting on metals, such as Cu and Sn, polymers, temporary glue and polyimide. Diamond bit cutting is an attractive, fast and economically viable option when processing on high topography wafers is required, or when smooth surface finish is required. Diamond bit cutting can planarize the surface of the high topography features on which conventional IC processing steps can be performed with ease.
Keywords :
cutting; diamond; wafer bonding; IC processing steps; diamond bit cutting; smooth surface finish; topography wafers; High speed optical techniques; Polyimides; Polymers; Rough surfaces; Stacking; Surface roughness; Surface topography; Temperature; Tin; Wafer bonding;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Electronics Packaging Technology Conference, 2009. EPTC '09. 11th
Conference_Location :
Singapore
Print_ISBN :
978-1-4244-5099-2
Electronic_ISBN :
978-1-4244-5100-5
Type :
conf
DOI :
10.1109/EPTC.2009.5416538
Filename :
5416538
Link To Document :
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