DocumentCode :
352196
Title :
A new strong inversion 5-parameter transistor mismatch model
Author :
Serrano-Gotarredona, Teresa ; Linares-Barranco, Bernabé
Author_Institution :
Nat. Microelectron. Center, Sevilla, Spain
Volume :
4
fYear :
2000
fDate :
2000
Firstpage :
381
Abstract :
A new 5-parameter MOS transistor mismatch model is introduced capable of predicting transistor mismatch with very high accuracy for ohmic and saturation strong inversion regions, including short channel transistors. The new model is based on splitting the contribution of the mobility degradation parameter mismatch into two components, and modulating them as the transistor transitions from ohmic to saturation regions. The model is tested for a wide range of transistor sizes (30), and shows excellent precision, never reported before for such a wide range of transistor sizes, including short channel transistors
Keywords :
MOSFET; carrier mobility; semiconductor device models; MOS transistor; five-parameter mismatch model; mobility degradation parameter; ohmic region; parameter extraction; saturation region; short channel transistor; strong inversion region; Degradation; Electronic mail; Intrusion detection; Length measurement; MOSFETs; Microelectronics; Predictive models; Size measurement; Strontium; Testing;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Circuits and Systems, 2000. Proceedings. ISCAS 2000 Geneva. The 2000 IEEE International Symposium on
Conference_Location :
Geneva
Print_ISBN :
0-7803-5482-6
Type :
conf
DOI :
10.1109/ISCAS.2000.858768
Filename :
858768
Link To Document :
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