Analysis on plasma chemistry in corona discharge process for NO removal using numerical simulations method

Nonthermal plasma techniques caused by high-voltage discharge have been a subject of investigation for pollution control and gas cleaning operations for the past decade. The ability to generate electrons with high energy levels at normal gas temperatures allows for the decomposition of background gas molecules and creates a reactive atmosphere and subsequent chemical processing. Modeling is playing an increasing vital role in process optimization and understanding of governing physical and chemical process. In this paper, chemical kinetics of the plasma-induced reactions is elucidated by chemical kinetics calculations. A reduced plasma chemistry model, in which radical reactions are selectively involved, is validated with experimental data. A qualitative model is resented which can explain the characteristic kinetics of the reactions in the plasma. The calculations indicate that the removal rate of NO increased with increasing water vapor and oxygen content in the flue gas indicating that OH radical is important for NO removal.