In-situ magnetoresistance measurements of a nanoconstricted nickel-iron film with in-plane configuration

Author

Ohsawa, Yuichi

Author_Institution

Toshiba Corp., Kawasaki, Japan

fYear

2005

fDate

4-8 April 2005

Firstpage

23

Lastpage

24

Abstract

A nanoscale NiFe permalloy point-contact was fabricated in planar configuration on a MgO substrate using an etching process with a horizontal incidence ion beam. In-situ anisotropic magnetoresistance (MR) measurements were successively performed in a vacuum to prevent oxidation. After around 800 seconds of milling, the MR ratio steeply increased to about 2.3% which was much larger than the anisotropic MR ratio of the MR film. In addition, the test-element showed low (high) resistance with parallel (anti-parallel) magnetic geometry of the pinned and free area.

Keywords

Permalloy; etching; ion beam effects; magnetic domain walls; magnetic thin films; magnetoresistance; milling; nanostructured materials; point contacts; MgO; NiFe; NiFe permalloy point-contact; anisotropic magnetoresistance; etching process; free area; horizontal incidence ion beam; in-plane configuration; in-situ magnetoresistance measurements; magnetic geometry; milling; nanoconstricted nickel-iron film; oxidation; pinned area; Anisotropic magnetoresistance; Electrical resistance measurement; Etching; Ion beams; Magnetic films; Milling; Oxidation; Performance evaluation; Substrates; Testing;

fLanguage

English

Publisher

ieee

Conference_Titel

Magnetics Conference, 2005. INTERMAG Asia 2005. Digests of the IEEE International

Print_ISBN

0-7803-9009-1

Type

conf

DOI

10.1109/INTMAG.2005.1463440

Filename

1463440