Three dimensional ALD of TiO2 for in-vivo biomedical sensor applications

Author

Schroder, Sven ; Dogan, Ozgu ; Schneidewind, Jessica ; Bertotti, Gabriel ; Keil, Stefan ; Gargouri, Hassan ; Arens, Michael ; Brose, Evelin ; Bruns, Jurgen ; Wolansky, Dirk ; Tillack, Bernd ; Vassanelli, Stefano ; Szyszka, Bernd ; Thewes, Roland

Author_Institution

Fac. of Electr. Eng. & Comput. Sci., Tech. Univ. Berlin, Berlin, Germany

fYear

2015

fDate

18-19 June 2015

Firstpage

21

Lastpage

24

Abstract

Titanium dioxide, known as a high-k biocompatible dielectric transducer material, is processed by means of ALD and applied to a 3D structure with dimensions typical for multi-site multi-channel in-vivo neural interfaces. High uniformity, high areal capacitance, and in particular low leakage current densities are achieved within a sufficiently wide operation voltage window. The results demonstrate the suitability of this process to provide dielectric interfaces for 3D biomedical applications.

Keywords

atomic layer deposition; bioelectric phenomena; biomedical materials; biomedical measurement; biomedical transducers; dielectric materials; leakage currents; materials preparation; neurophysiology; titanium compounds; 3D structure; TiO₂; areal capacitance; atomic layer deposition; dielectric interface; high-k biocompatible dielectric transducer material; in vivo biomedical sensor application; leakage current density; multi-site multi-channel in vivo neural interface; operation voltage window; three dimensional ALD; titanium dioxide processing; uniformity; Capacitance; Current measurement; Dielectric measurement; Dielectrics; Electrodes; Silicon; Tin; TiO2; atomic layer deposition (ALD); biochip; in-vivo neural interfaces;

fLanguage

English

Publisher

ieee

Conference_Titel

Advances in Sensors and Interfaces (IWASI), 2015 6th IEEE International Workshop on

Conference_Location

Gallipoli

Type

conf

DOI

10.1109/IWASI.2015.7184978

Filename

7184978