Title :
Strong atmospheric stability of carbon nanotubes under high temperature annealing
Author :
Lim, Han Eol ; Ryu, Je Hwang ; Son, Byung Taek ; Oh, Hye Mi ; Bae, Na Young ; Jang, Jin ; Moon, Jong Hynn ; Nakamoto, Masayuki ; Park, Kyu Chang
Author_Institution :
Dept. of Inf. Display, Kyung Hee Univ., Seoul, South Korea
Abstract :
In this paper, three types of multi walled carbon nanotubes (CNTs) were grown with a conventional method (Type I), resist-assisted patterning (Type II, RAP), and robust (Type III) method. Electron emission current were compared with atmospheric stability of CNTs grown through plasma enhanced chemical vapor deposition. For environmental stability measurements, these samples were annealed in 700 degC furnace up to 10 hr and/or rapid thermal annealing system under ambient environment. The detailed structural changes were evaluated through SEM with various ambient annealing time and relationship to electron emission current.
Keywords :
carbon nanotubes; electron emission; nanopatterning; plasma CVD; rapid thermal annealing; scanning electron microscopy; thermal stability; C; SEM; ambient environment; atmospheric stability; conventional method; electron emission current; multiwalled carbon nanotubes; plasma enhanced chemical vapor deposition; rapid thermal annealing; resist-assisted patterning; robust method; structural changes; temperature 700 degC; time 10 h; Carbon nanotubes; Chemical vapor deposition; Electron emission; Plasma chemistry; Plasma measurements; Plasma stability; Plasma temperature; Rapid thermal annealing; Robustness; Thermal stability;
Conference_Titel :
Vacuum Nanoelectronics Conference, 2009. IVNC 2009. 22nd International
Conference_Location :
Shizuoka
Print_ISBN :
978-1-4244-3587-6
Electronic_ISBN :
978-1-4244-3588-3
DOI :
10.1109/IVNC.2009.5271625
