DocumentCode
3528375
Title
Emission uniformity of nanocrystalline silicon based metal-oxide-semiconductor cathodes
Author
Shimawaki, Hidetaka ; Murakami, Katsuhisa ; Kida, Yo ; Neo, Yoichiro ; Mimura, Hidenori ; Wakaya, Fujio ; Takai, Mikio
Author_Institution
Grad. Sch. of Eng., Hachinohe Inst. of Technol., Hachinohe, Japan
fYear
2009
fDate
20-24 July 2009
Firstpage
307
Lastpage
308
Abstract
In this paper, we report on the evaluation of the emission uniformity in the emission area of the cathodes by using a Faraday-cup with a probe hole of 20 mum in diameter. In the experiments, the cathodes were operated in pulse mode with the frequency of 100 Hz with pulse width of 250 mus in a vacuum of 10"8 Pa.
Keywords
cathodes; nanostructured materials; silicon; Faraday-cup; emission uniformity; frequency 100 Hz; metal-oxide-semiconductor cathodes; nanocrystalline silicon; probe hole; size 20 mum; time 250 mus; Cathodes; Current distribution; Electron beams; Electron emission; Gold; Low voltage; Nanoscale devices; Silicon; Space vector pulse width modulation; Tunneling;
fLanguage
English
Publisher
ieee
Conference_Titel
Vacuum Nanoelectronics Conference, 2009. IVNC 2009. 22nd International
Conference_Location
Shizuoka
Print_ISBN
978-1-4244-3587-6
Electronic_ISBN
978-1-4244-3588-3
Type
conf
DOI
10.1109/IVNC.2009.5271701
Filename
5271701
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