DocumentCode :
3528414
Title :
Electron emission characteristics of BaTiO3 thin films
Author :
Ghemes, Adrian ; Neo, Yoichiro ; Okada, Morihiro ; Aoki, Toru ; Mimura, Hidenori
Author_Institution :
Res. Inst. of Electron., Shizuoka Univ., Hamamatsu, Japan
fYear :
2009
fDate :
20-24 July 2009
Firstpage :
305
Lastpage :
306
Abstract :
In this paper we report the electron emission from sol-gel derived BaTiO3 thin films pretreated in hydrochloric acids. Using a conventional sol-gel technique, we obtained 1 mum thick BaTiO3 ferroelectric thin films onto Ni-Cr substrate. These thin films were pretreated for 45 seconds in concentrated hydrochloric acid (HCl) in order to increase the surface roughness.
Keywords :
barium compounds; electron emission; ferroelectric thin films; sol-gel processing; surface roughness; BaTiO3; Ni-Cr; conventional sol-gel method; electron emission characteristics; ferroelectric thin film; hydrochloric acid; size 1 mum; surface roughness; time 45 s; Electron emission;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Vacuum Nanoelectronics Conference, 2009. IVNC 2009. 22nd International
Conference_Location :
Shizuoka
Print_ISBN :
978-1-4244-3587-6
Electronic_ISBN :
978-1-4244-3588-3
Type :
conf
DOI :
10.1109/IVNC.2009.5271704
Filename :
5271704
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=3528414
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