Title :
Design, fabrication and modeling of microbeam structures for gas sensor applications in CMOS technology
Author :
Voiculescu, Ioana ; Zaghloul, Mona ; McGill, R. Andrew
Author_Institution :
Dept. of Electr. & Comput. Eng., George Washington Univ., DC, USA
Abstract :
In this paper we discuss the design, fabrication, and modeling of an electrostatically actuated transducer that is operated in a resonant mode. The transducer is designed for gas sensor applications. The microstructure with high-aspect ratio laminated beam or bridge suspensions, has been fabricated using a 0.6 μm three metal, double poly CMOS process. The fabricated chip was post processed by a sequence of two maskless dry etching steps. A thin sorbent polymer layer is included in the design of the microbeam chemical sensor. The devices were designed to provide a relatively large surface area to coat with the sorbent polymer. Gas sorption in the polymer layer can be monitored as a function of the resonant frequency of the device. The device frequency is measured by piezoresistors mounted in a Wheatstone bridge configuration. The fabricated sensors are intended for use in monitoring hazardous gases and vapors. In order to optimize the device resonant frequencies, a variety of microbeam structures were designed with different dimensions. These structures were modeled with a finite element analysis program. A number of selected structures were fabricated in a single chip design.
Keywords :
CMOS integrated circuits; adsorption; electrostatic actuators; finite element analysis; gas sensors; integrated circuit layout; micromechanical resonators; microsensors; sputter etching; 0.6 micron; ANSYS simulation; CMOS technology; Wheatstone bridge configuration; bridge suspensions; design; electrostatically actuated transducer; fabrication; finite element analysis program; gas sensor applications; gas sorption; hazardous gas monitoring; high-aspect ratio laminated beam; large surface area; maskless dry etching steps; microbeam chemical sensor; microbeam structures; microstructure; modeling; piezoresistors; resonant frequency; resonant mode operation; single chip design; thin sorbent polymer layer; three metal double poly CMOS process; CMOS technology; Fabrication; Gas detectors; Microstructure; Monitoring; Polymers; Resonance; Resonant frequency; Semiconductor device modeling; Transducers;
Conference_Titel :
Circuits and Systems, 2003. ISCAS '03. Proceedings of the 2003 International Symposium on
Print_ISBN :
0-7803-7761-3
DOI :
10.1109/ISCAS.2003.1205171