• DocumentCode
    3529802
  • Title

    Selective etching in laser-written semiconductor-doped glasses

  • Author

    Smuk, A.Y. ; Lawandy, N.M.

  • Author_Institution
    Dept. of Phys., Brown Univ., Providence, RI, USA
  • fYear
    1998
  • fDate
    3-8 May 1998
  • Firstpage
    187
  • Lastpage
    188
  • Abstract
    Summary form only given. Direct laser writing on the surface of the semiconductor-doped glass (SDG) is based on the absorptive properties of the material and the ability of the melted volume to expand and resolidify above the surface, forming smooth topographic features with positive relief. This single-step technique is useful for a number of applications including the fabrication of diffractive and refractive microoptics and is particularly suitable for rapid prototyping. In this work we report on the observation of selective wet etching process, which takes place once relief features are created.
  • Keywords
    etching; laser materials processing; optical fabrication; optical glass; semiconductor doped glasses; diffractive microoptics; direct laser writing; fabrication; rapid prototyping; refractive microoptics; resolidification; selective wet etching; semiconductor doped glass; surface relief; surface topography; Diffraction; Etching; Fabrication; Glass; Optical materials; Semiconductor lasers; Semiconductor materials; Surface emitting lasers; Surface topography; Writing;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Lasers and Electro-Optics, 1998. CLEO 98. Technical Digest. Summaries of papers presented at the Conference on
  • Conference_Location
    San Francisco, CA, USA
  • Print_ISBN
    1-55752-339-0
  • Type

    conf

  • DOI
    10.1109/CLEO.1998.676034
  • Filename
    676034