DocumentCode :
353070
Title :
Prospects of silicon-germanium-based technology for very high-speed circuits
Author :
Subbanna, S. ; Johnson, J. ; Freeman, G. ; Volant, R. ; Groves, R. ; Herman, D. ; Meyerson, B.
Author_Institution :
Microelectron., IBM Corp., Hopewell Junction, NY, USA
Volume :
1
fYear :
2000
fDate :
11-16 June 2000
Firstpage :
361
Abstract :
Silicon-germanium (SiGe) heterojunction bipolar transistor (HBT) BiCMOS technology has developed into a production manufacturing technology that replaces and extends the performance of silicon-based BiCMOS technology. The market impetus for this development has been the insatiable requirement for bandwidth in network communication at speeds up to 40 Gbit/s and the rapid growth of the global cellular and wireless LAN markets. There has also been much work on the use of silicon-based structures for microwave frequencies. This paper focuses on a review of the status of our SiGe BiCMOS technology, based on four generations of scaling CMOS-compatible SiGe. We also show in principle how techniques commonly used in Ill-V semiconductor technology and microwave systems can also be applied to SiGe chips, along with silicon-on-insulator (SOI) and other existing technology, to provide a possible further extension in SiGe performance, for 50+ GHz circuits.
Keywords :
BiCMOS digital integrated circuits; BiCMOS integrated circuits; Ge-Si alloys; MIMIC; integrated circuit manufacture; integrated circuit technology; semiconductor materials; very high speed integrated circuits; 40 Gbit/s; 50 GHz; SOI technology; SiGe; SiGe HBT BiCMOS technology; SiGe heterojunction bipolar transistor; production manufacturing technology; very high-speed circuits; Bandwidth; BiCMOS integrated circuits; CMOS technology; Germanium silicon alloys; Heterojunction bipolar transistors; Manufacturing; Microwave technology; Production; Silicon germanium; Silicon on insulator technology;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Microwave Symposium Digest. 2000 IEEE MTT-S International
Conference_Location :
Boston, MA, USA
ISSN :
0149-645X
Print_ISBN :
0-7803-5687-X
Type :
conf
DOI :
10.1109/MWSYM.2000.861018
Filename :
861018
Link To Document :
بازگشت