DocumentCode :
3531391
Title :
A case study of Short Term Cell-Flipping technique for mitigating NBTI degradation on cache
Author :
Kunitake, Yuji ; Sato, Toshinori ; Yasuura, Hiroto
Author_Institution :
Kyushu Univ., Fukuoka, Japan
fYear :
2010
fDate :
3-4 Aug. 2010
Firstpage :
301
Lastpage :
307
Abstract :
Negative Bias Temperature Instability (NBTI) is one of the major reliability problems in advanced technologies. NBTI causes threshold voltage shift in a PMOS transistor which is biased to negative voltage. In an SRAM cell, due to NBTI, threshold voltage shifts in the load transistors. The degradation has the impact on Static Noise Margin (SNM), which is a measure of read stability of a 6-T SRAM cell. Because an SRAM cell consists of two inverters, one of the load transistors is always stressed. In order to mitigate NBTI degradation, we proposed Short Term Cell-Flipping technique (STCF) for SRAM cell. This technique makes the stress probability on load transistors in an SRAM cell close to 50%. In this paper, we apply STCF technique to cache memories, and discuss its potential to mitigate NBTI degradation.
Keywords :
MOSFET; SRAM chips; cache storage; probability; stability; NBTI degradation; PMOS transistor; SRAM cell; advanced technology; cache memory; inverters; load transistors; negative bias temperature instability; negative voltage; read stability; short term cell-flipping technique; static noise margin; stress probability; threshold voltage shift; Degradation; MOSFETs; Negative bias temperature instability; Niobium compounds; Noise measurement; Random access memory; Stability; Threshold voltage; Titanium compounds; Transistors; Cache; NBTI; SRAM; stress probability; threshold voltage shift;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Quality Electronic Design (ASQED), 2010 2nd Asia Symposium on
Conference_Location :
Penang
Print_ISBN :
978-1-4244-7809-5
Type :
conf
DOI :
10.1109/ASQED.2010.5548256
Filename :
5548256
Link To Document :
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