Title :
Application for electric resistance element of granular films
Author_Institution :
Toyota Central R&D Labs. Inc., Aichi, Japan
Abstract :
Thin film electric resistance elements were presented, utilizing granular films of CoAlO. Electrical properties of the films show dependence with metal content and granular nanostructure. The values of α and β in the optimum metal content were as low as those of conventional metal film resistances. Sheet resistance values were observed to be much higher than those of conventional metal film resistances. Therefore, granular films are useful for application to thin film resistance for purpose of minimizing the resistance element.
Keywords :
aluminium compounds; cobalt compounds; electric resistance; electrical resistivity; granular materials; nanostructured materials; thin film resistors; thin films; CoAlO; electrical properties; granular films; granular nanostructure; metal content; sheet resistance; thin film electric resistance element; Annealing; Electric resistance; Electric variables measurement; Electrical resistance measurement; Microstructure; Semiconductor films; Temperature measurement; Thin film circuits; Thin film sensors; Transistors;
Conference_Titel :
Magnetics Conference, 2005. INTERMAG Asia 2005. Digests of the IEEE International
Print_ISBN :
0-7803-9009-1
DOI :
10.1109/INTMAG.2005.1463830
