• DocumentCode
    3533360
  • Title

    Fabrication of ultra high aspect ratio silica nanocone arrays by multiple shrinking mask etching

  • Author

    Choi, Hyungryul J. ; Cornago, Ignacio ; Kim, Jeong-Gil ; Savas, Tim ; Barbastathis, George

  • Author_Institution
    Dept. of Mech. Eng., Massachusetts Inst. of Technol., Cambridge, MA, USA
  • fYear
    2012
  • fDate
    6-9 Aug. 2012
  • Firstpage
    1
  • Lastpage
    2
  • Abstract
    We propose and experimentally demonstrate a novel method to fabricate subwavelength silica nanocone arrays with high aspect ratio (~7) for multifunctional surfaces having anti-reflective, self-cleaning, and anti-fogging properties.
  • Keywords
    nanofabrication; nanophotonics; nanostructured materials; optical arrays; optical fabrication; silicon compounds; SiO2; antifogging properties; antireflective properties; aspect ratio; multifunctional surfaces; multiple shrinking mask etching; self-cleaning properties; silica nanocone array fabrication; Etching; Nanostructures; Optical device fabrication; Optical films; Silicon compounds; anti-fogging; anti-reflective; enhanced transmission; high aspect ratio nanostructure; self-cleaning; wetting;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Optical MEMS and Nanophotonics (OMN), 2012 International Conference on
  • Conference_Location
    Banff, AB
  • ISSN
    2160-5033
  • Print_ISBN
    978-1-4577-1511-2
  • Type

    conf

  • DOI
    10.1109/OMEMS.2012.6318772
  • Filename
    6318772
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=3533360