• DocumentCode
    3533674
  • Title

    Wafer-scale silica optomechanical oscillators with low threshold power and low phase noise for monolithic optical frequency references

  • Author

    Grine, Alejandro J. ; Quack, Niels ; Grutter, Karen ; Rocheleau, Tristan O. ; Huang, Jie ; Nguyen, Chuong T. ; Wu, Ming C.

  • Author_Institution
    Dept. of Electr. Eng. & Comput. Sci., Univ. of California, Berkeley, CA, USA
  • fYear
    2012
  • fDate
    6-9 Aug. 2012
  • Firstpage
    51
  • Lastpage
    52
  • Abstract
    We present wafer-scale processed optomechanical oscillators with low threshold power (<;120μW) owing to high Qoptical = 5.3M, with phase noise of -110dBc/Hz (10kHz offset, 18.6MHz carrier). Phase noise is modeled, and measured vs. Qoptical and Qmechanical.
  • Keywords
    integrated optics; optical fabrication; optical resonators; oscillators; radiation pressure; silicon compounds; SiO2; low phase noise; low threshold power; monolithic optical frequency references; wafer scale silica optomechanical oscillator; Noise measurement; Optical device fabrication; Optical noise; Optical ring resonators; Optical variables measurement; Phase noise; Q factor;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Optical MEMS and Nanophotonics (OMN), 2012 International Conference on
  • Conference_Location
    Banff, AB
  • ISSN
    2160-5033
  • Print_ISBN
    978-1-4577-1511-2
  • Type

    conf

  • DOI
    10.1109/OMEMS.2012.6318797
  • Filename
    6318797
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=3533674