• DocumentCode
    3533705
  • Title

    Growth of perpendicular FePt thin films at low temperature

  • Author

    Lai, Chih-Huang ; Wu, Y. Yun-Chung ; Chiang, Chao-Chien

  • Author_Institution
    Dept. of Mater. Sci. & Eng., Nat. Tsing Hua Univ., Hsinchu, Taiwan
  • fYear
    2005
  • fDate
    4-8 April 2005
  • Firstpage
    869
  • Lastpage
    870
  • Abstract
    In this study, the non-epitaxial FePt thin films with [001] preferred orientation have been prepared by using magnetron sputtering. A Cr65Mo15Mn20 underlayer was used to induce strain energy, and Fe and Pt intermediate layers were used to adjust the orientation of FePt. By depositing films at 250°C and post-annealing at 300°C in the forming gas, a high perpendicular coercivity about 6800 Oe can be obtained.
  • Keywords
    annealing; chromium alloys; coercive force; ferromagnetic materials; iron alloys; magnetic thin films; manganese alloys; metallic thin films; molybdenum alloys; platinum alloys; sputter deposition; 250 degC; 300 degC; Cr65Mo15Mn20; FePt; forming gas; magnetron sputtering; nonepitaxial thin films; perpendicular coercivity; postannealing; preferred orientation; strain energy; Annealing; Capacitive sensors; Chaos; Coercive force; Lattices; Sputtering; Temperature; Tensile stress; Transistors; X-ray diffraction;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Magnetics Conference, 2005. INTERMAG Asia 2005. Digests of the IEEE International
  • Print_ISBN
    0-7803-9009-1
  • Type

    conf

  • DOI
    10.1109/INTMAG.2005.1463863
  • Filename
    1463863
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=3533705