• DocumentCode
    3533927
  • Title

    Sol gel dip coated Aluminium doped zinc oxide films and their properties

  • Author

    Kalaivanan, A. ; Ivaramamoorthy, K.S. ; Perumal, S. ; Murali, K.R.

  • Author_Institution
    Dept. of Phys., Arignar Anna Coll., Aralvaymozhi, India
  • fYear
    2011
  • fDate
    28-30 Nov. 2011
  • Firstpage
    94
  • Lastpage
    96
  • Abstract
    ZnO films were deposited on cleaned glass substrates from AR grade zinc chloride, acrylamide, bisacrylamide and ammonium persulphate. X-ray diffraction studies indicated the major diffraction peaks decreased with increasing the Al concentration. For doping with aluminium, 0.01M of AICI3 was introduced in the deposition mixture. The band gap varies from 3.16 eV to 3.20 eV with increase of Al doping. This blue shift behavior or broadening in the band gap is mainly due to the Moss-Burstein band filling effect. The grain size and surface roughness varied from 45 nm to 15 nm and 3.5 nm to 1.3 nm respectively with increase of aluminium concentration. The electrical resistivity of the films decreases with increase of Al doping by three orders of magnitude. The mobility and carrier density increase with Al doping. Comparing the Al doped ZO with the undoped ZnO films, Al(TO) and El (LO)modes are shifted to the high frequency side in the Raman spectrum.
  • Keywords
    II-VI semiconductors; Raman spectra; X-ray diffraction; aluminium; carrier density; carrier mobility; dip coating; doping profiles; electrical resistivity; grain size; optical constants; semiconductor doping; semiconductor growth; semiconductor thin films; sol-gel processing; spectral line shift; surface roughness; wide band gap semiconductors; zinc compounds; Moss-Burstein band filling effect; Raman spectrum; X-ray diffraction; ZnO:Al; aluminium doped zinc oxide films; ammonium persulphate; band gap; bisacrylamide; blue shift; carrier density; cleaned glass substrates; dip coating; doping concentration; electrical resistivity; grain size; mobility; sol-gel method; surface roughness; zinc chloride; Artificial intelligence; Diffraction; Epitaxial growth; Optical diffraction; Optical films; Optical sensors; Zinc oxide; electronic material; semiconductor; thin films;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Nanoscience, Engineering and Technology (ICONSET), 2011 International Conference on
  • Conference_Location
    Chennai
  • Print_ISBN
    978-1-4673-0071-1
  • Type

    conf

  • DOI
    10.1109/ICONSET.2011.6167919
  • Filename
    6167919