Nanopatterning magnetic thin films by Ga ion irradiation

Author

McGrouther, D.R. ; Wang, Y. ; Chapman, J.N. ; McVitie, S. ; Ferre, J.

Author_Institution

Dept. of Phys. & Astron., Glasgow Univ., UK

fYear

2005

fDate

4-8 April 2005

Firstpage

913

Lastpage

914

Abstract

Local patterning in two film systems with different properties can be achieved using ion irradiation. The aim is to create a high density of domain walls at predetermined sites in a film. The strategy adopted is to write narrow lines by focused ion beam (FIB), such sites act as preferred sites for walls to locate. This is a direct consequence of structural modifications. The effect of the irradiation on the physical microstructure of the films are studied by high resolution and analytical electron microscopy whilst Lorentz microscopy is used to investigate the way the magnetic properties are modified.

Keywords

cobalt; cobalt alloys; crystal microstructure; electron microscopy; ion beam effects; magnetic domain walls; magnetic thin films; magnetisation; nanopatterning; platinum; tantalum; Co-Pt; CoFe-Ta; Ga ion irradiation; Lorentz microscopy; analytical electron microscopy; domain wall; film system; focused ion beam; high resolution electron microscopy; irradiation; local nanopatterning; magnetic thin film; microstructure; structural modification; Anisotropic magnetoresistance; Geometry; Magnetic domain walls; Magnetic films; Magnetic multilayers; Magnetization; Nanopatterning; Strips;

fLanguage

English

Publisher

ieee

Conference_Titel

Magnetics Conference, 2005. INTERMAG Asia 2005. Digests of the IEEE International

Print_ISBN

0-7803-9009-1

Type

conf

DOI

10.1109/INTMAG.2005.1463885

Filename

1463885