DocumentCode
3534165
Title
In-situ fabrication of {111} mirror and optical bench using double-sided anisotropic wet etching of {100} silicon wafer
Author
Kim, Jung-Mu ; Kim, Hyunseok ; Yoo, Sunghyun ; Lee, Kook-Nyung ; Kim, Yong-Kweon
Author_Institution
Dept. of Electron. Eng., Chonbuk Nat. Univ., Jeonju, South Korea
fYear
2012
fDate
6-9 Aug. 2012
Firstpage
125
Lastpage
126
Abstract
This work presents a novel fabrication method for {111} dual mirror and optical bench using double-sided anisotropic wet etching of <;100>; oriented silicon wafer. The roughness of the wet etched {111} plane is 8 nm.
Keywords
elemental semiconductors; etching; mirrors; optical fabrication; silicon; double-sided anisotropic wet etching; mirror fabrication; optical bench; size 8 nm; wafer; wet etched roughness; Geometrical optics; Mirrors; Optical device fabrication; Optical fibers; Silicon; Wet etching; <100> oriented silicon; double-sided anisotropic wet etching; optical bench; {111} mirror;
fLanguage
English
Publisher
ieee
Conference_Titel
Optical MEMS and Nanophotonics (OMN), 2012 International Conference on
Conference_Location
Banff, AB
ISSN
2160-5033
Print_ISBN
978-1-4577-1511-2
Type
conf
DOI
10.1109/OMEMS.2012.6318834
Filename
6318834
Link To Document