Title :
Epitaxial thin films of half-metallic CrO2 deposited on oxidized Si substrates by PLD using Cr2O3 target
Author :
Dwivedi, Sudhanshu ; Biswas, Somnath
Author_Institution :
LNM Inst. of Inf. Technol., Jaipur, India
Abstract :
Epitaxial thin films of half-metallic compound CrO2 with (110) crystal orientation have been deposited on oxidized Si (100) substrates by pulsed laser deposition (PLD) technique using KrF excimer laser and Cr2O3 target. The deposited films were characterized with XRD, SEM, FTIR, surface profilometry, AFM and spectroscopic ellipsometry.
Keywords :
Fourier transform spectra; X-ray diffraction; atomic force microscopy; chromium compounds; crystal orientation; ellipsometry; epitaxial layers; excimer lasers; infrared spectra; laser materials processing; pulsed laser deposition; scanning electron microscopy; (110) crystal orientation; AFM; CrO2; FTIR; KrF excimer laser; PLD; SEM; XRD; deposited film; epitaxial thin film; half-metallic compound; oxidized Si (100) substrate; pulsed laser deposition technique; spectroscopic ellipsometry; surface profilometry; Ellipsometry; Epitaxial growth; Lattices; Polymers; Half-metals; chromium di-oxide (CrO2); epitaxial thin films; pulsed laser deposition;
Conference_Titel :
Nanoscience, Engineering and Technology (ICONSET), 2011 International Conference on
Conference_Location :
Chennai
Print_ISBN :
978-1-4673-0071-1
DOI :
10.1109/ICONSET.2011.6167958
