Title :
Off-centering reduction of coplanar micro liquid lens using a thickness-gradient dielectric
Author :
Yangkyu Park ; Seungwan Seo ; Jong-Hyun Lee
Author_Institution :
Dept. of Nanobio Mat. & Electron., Gwangju Inst. of Sci. & Technol. (GIST), Gwangju, South Korea
Abstract :
We have fabricated coplanar liquid lens having dielectric layer with thickness gradient, which was realized using reflow process of photoresist, demonstrating that the off-centering error was 20um that is considerably smaller than geometrical centering.
Keywords :
dielectric materials; microlenses; photoresists; coplanar microliquid lens; dielectric layer; off-centering error; off-centering reduction; photoresist; reflow process; thickness-gradient dielectric; Adaptive optics; Biomedical optical imaging; Dielectrics; Lenses; Liquids; Optical device fabrication; Resists; dielectric; electrowetting; liquid lens; reflow; self-centering; thickness gradient;
Conference_Titel :
Optical MEMS and Nanophotonics (OMN), 2012 International Conference on
Conference_Location :
Banff, AB
Print_ISBN :
978-1-4577-1511-2
DOI :
10.1109/OMEMS.2012.6318876
