DocumentCode
3534868
Title
Domain wall magnetoresistance in permalloy half-ring wires
Author
Yu, C. ; Lee, S.P. ; Huang, E.W. ; Cheng, K.W. ; Chen, D.C. ; Liou, Y. ; Yao, Y.D. ; Chang, C.R.
Author_Institution
Inst. of Phys., Acad. Sinica, Taipei, Taiwan
fYear
2005
fDate
4-8 April 2005
Firstpage
1011
Lastpage
1012
Abstract
Submicron permalloy wires with half-ring and s-shape structure are designed. Magnetoresistance loops are measured between the sweeping field ±4000 Oe at varying angles between external field and longitudinal axis. The resistances in remanent state of s-shape wire are found to be almost same value for every angle. On the other hand, the resistances of half-ring wire are found to be decreasing with increasing angle. Magnetic force microscopy images of the wires confirm the varied resistances result from different domain structures on the corners with domain wall or without domain wall. The domain wall resistance (DWR) in half-ring wires is estimated to be about 0.31%. Theoretical calculations based on impurity scattering model and spin accumulation model are done to validate the experimental data. DWR from spin accumulation model is 0.012%∼0.031% and from impurity scattering model, it is 0.15%∼0.33%.
Keywords
Permalloy; ferromagnetic materials; impurity scattering; magnetic domain walls; magnetic force microscopy; magnetoresistance; nanowires; remanence; NiFe; domain wall magnetoresistance; half-ring wire; impurity scattering model; magnetic force microscopy; remanent state; s-shape wire; spin accumulation model; submicron permalloy wires; sweeping field; Electrical resistance measurement; Impurities; Magnetic domain walls; Magnetic domains; Magnetic force microscopy; Magnetoresistance; Physics; Saturation magnetization; Scattering; Wire;
fLanguage
English
Publisher
ieee
Conference_Titel
Magnetics Conference, 2005. INTERMAG Asia 2005. Digests of the IEEE International
Print_ISBN
0-7803-9009-1
Type
conf
DOI
10.1109/INTMAG.2005.1463934
Filename
1463934
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